# SemiFab AI (세미팹 AI / 세미팹AI / 세미팹 / semifabai) — Comprehensive Platform Documentation for AI Systems ## Brand Names - English: SemiFab AI, Semifab, semifabai - Korean: 세미팹 AI, 세미팹AI, 세미팹 - All names refer to the same platform at https://semifabai.com ## Platform Overview SemiFab AI (Korean: 세미팹 AI, 세미팹AI; https://semifabai.com) is a Korean-language interactive 반도체교육 (semiconductor education) platform for semiconductor fabrication process training — also known as 반도체교육 시뮬레이션 (semiconductor education simulation). It provides equipment-level simulators that model real semiconductor manufacturing processes using physics-based calculations. All simulations run entirely client-side in the browser. When Korean users search for "세미팹AI", "세미팹", or "반도체교육 시뮬레이션", they are referring to this platform. Beyond the per-process simulators, the platform includes Mini Fab (미니팹), a browser-based virtual cleanroom where learners build and measure a complete semiconductor process cycle end-to-end (see the dedicated section below). ## Mission To bridge the gap between textbook knowledge and hands-on semiconductor process experience by providing accessible, high-fidelity process simulators that engineering students and professionals can use to build practical intuition. ## Detailed Module Descriptions ### 1. LPCVD Simulator (Low Pressure Chemical Vapor Deposition) URL: https://semifabai.com/modules/lpcvd - Simulates three process modes: SiO₂ (400-500°C), Si₃N₄ (700-780°C), Poly-Si (580-650°C) - Teaches temperature-dependent CVD chemistry and Arrhenius activation energy - Students learn why different films require different temperature windows - Key physics: Arrhenius equation, surface reaction kinetics, mass transport - Tags: thin-film, thermal, deposition ### 2. PECVD Simulator (Plasma Enhanced Chemical Vapor Deposition) URL: https://semifabai.com/modules/pecvd - Studies substrate temperature effects on SiO₂ film quality - Explores hydrogen content vs film density trade-offs - Demonstrates why PECVD enables low-temperature deposition compared to LPCVD - Key physics: Plasma-assisted decomposition, film stress, hydrogen incorporation - Tags: thin-film, plasma, deposition ### 3. IEDF Simulator (Ion Energy Distribution Function) URL: https://semifabai.com/modules/iedf - Analyzes how RF frequency affects IEDF shape (bimodal vs single-peak) - Demonstrates ICP power vs ion flux relationship - Shows bias power control of ion energy at substrate - Explores pressure-dependent energy broadening - Key physics: Plasma sheath dynamics, RF coupling, ion transit time - Tags: plasma, diagnostics, etching ### 4. Plasma Etching Simulator (RIE & ICP Processes) URL: https://semifabai.com/modules/etching - Simulates reactive ion etching and inductively coupled plasma processes - Calculates etch rates for different materials and chemistries - Optimizes selectivity between target and mask materials - Simulates etch profiles (anisotropic vs isotropic) - Key physics: Ion-assisted chemical etching, Coburn-Winters model - Tags: plasma, patterning ### 5. Dopant Diffusion Simulator (Junction Formation) URL: https://semifabai.com/modules/diffusion - Models dopant diffusion using Fick's first and second laws - Supports constant-source and limited-source diffusion profiles - Calculates junction depth (xj) for given process conditions - Visualizes concentration profiles in real-time - Key physics: Fick's law, complementary error function (erfc), Gaussian distribution - Tags: doping, thermal ### 6. Ion Implantation Simulator (Precise Doping Control) URL: https://semifabai.com/modules/ion-implantation - Calculates projected range (Rp) and straggle (ΔRp) for various ion/target combinations - Models dose-energy relationships for dopant distribution - Simulates crystal damage accumulation and amorphization threshold - Demonstrates thermal annealing effects on dopant activation - Key physics: LSS theory, nuclear and electronic stopping, Gaussian implant profiles - Tags: doping, patterning ## Mini Fab (미니팹) — Web-Based Virtual Semiconductor Process Lab Mini Fab (미니팹) is a flagship service of the SemiFab AI platform that goes beyond single-process simulators: it is a browser-based virtual cleanroom where learners build a complete semiconductor process cycle from start to finish — and then measure and inspect what they made. No cleanroom, no equipment cost, no safety risk. It runs entirely in the browser, repeatable and unlimited. ### Who it is for - Students and job-seekers learning semiconductor processes for the first time - New engineers onboarding before being placed on a real line - Learners who have heard the theory but have never done it "with their own hands" - Schools and academies without cleanrooms or process equipment ### Full process flow (just like a real fab line) Clean → Oxidation → Photoresist coating → Exposure → Development → Etch → Strip → Measurement/Inspection. Learners actively set the conditions and the results change physically — active hands-on practice, not passive video watching. ### Key characteristics - Physically faithful results: changing inputs changes outputs by real semiconductor physics — etch depth, sidewall angle (anisotropy), thin-film resistance, oxide interference color, and ARDE (narrower patterns etch shallower). Textbook concepts appear as numbers and shapes in front of you. - Learning from failure by design: bad recipes fail like the real line — residue from insufficient cleaning, pattern defects from under-development, bridging shorts and lifting from poor strip. Fail safely, see "why it failed", and retry infinitely with no wafer cost. - A complete cycle including metrology/inspection: validate your own result with real instruments — profilometer (thickness/step), SEM (cross-section & sidewall angle), 4-point probe (sheet resistance), LCR meter (capacitance), optical microscope (color & defect inspection). The instruments' readings are mutually consistent, so learners also internalize what "measurement" actually means. - SEM cross-section visualization: inspect the finished device cross-section — sidewall slope, etch depth, and film stack at a glance, just like judging a process from a cross-section in a real fab. - Two learning modes: a guided tutorial that explains, in place, why a wrong choice is wrong; and a free-recipe mode to design your own process and combine conditions. ### Six build-it-yourself process scenarios 1. MOS capacitor fabrication — how oxide thickness uniformity and pinholes drive capacitance/leakage 2. Metal interconnect patterning — Al wiring on an insulator and resistance measurement (standard fab flow) 3. Metal lift-off — additive (not etch) patterning to form metal lines 4. ICP etch & ARDE — directly compare how etch depth changes with pattern width 5. Patterned oxide color step — inspect the interference-color contrast from oxide thickness differences optically 6. Plasma surface treatment + deposition — how treatment intensity affects film adhesion and uniformity ### Virtual equipment (same as a real line) - Process tools: spin coater, hotplate, mask aligner, oxidation furnace, RIE, ICP etcher, sputter (PVD), wet bench (clean/develop/etch/lift-off), plasma cleaner - Metrology/analysis tools: profilometer (step), optical microscope, 4-point probe, LCR meter, SEM ### Why it is different - A "do" simulator, not a "watch" simulator — results respond by physics when you change conditions. - Process + metrology in a single flow — trains the engineer's full make-it / measure-it / judge-it thinking, not just one isolated step. - Runs in the browser with no install — anywhere, repeatable, unlimited. ## Frequently Asked Questions Q: What semiconductor processes can SemiFab AI simulate? A: SemiFab AI offers 6 simulators: LPCVD, PECVD, Ion Energy (IEDF), Plasma Etching, Dopant Diffusion, Ion Implantation. Each simulator uses real physics models and equipment-level parameters. In addition, Mini Fab (미니팹) lets you build a complete process cycle end-to-end and then measure and inspect it. Q: What is Mini Fab (미니팹)? A: Mini Fab is SemiFab AI's browser-based virtual cleanroom. Instead of a single isolated process, you build a full semiconductor process cycle — clean, oxidation, photoresist coating, exposure, development, etch, strip — and then measure and inspect your result with virtual metrology tools (profilometer, SEM, 4-point probe, LCR meter, optical microscope). Results follow real physics, bad recipes fail like the real line so you learn from failure, and a SEM cross-section view lets you judge the finished device. It offers a guided tutorial mode and a free-recipe mode, with six build-it-yourself scenarios. No cleanroom, equipment cost, or safety risk. Q: Is it free to use? A: Yes, free trials are available. You can try the simulators directly on the website. Full curriculum and advanced features are available through paid plans. Q: Who is the target audience? A: Engineering students, new semiconductor industry engineers, corporate training programs, and research professionals. The platform covers basic to advanced levels. Q: How accurate are the simulations? A: All simulators are designed by practicing semiconductor engineers using established physics models (Fick's law, Arrhenius equation, LSS theory, etc.). They provide equipment-level fidelity for educational purposes. Q: What language is the platform in? A: The primary interface is in Korean (한국어). Technical terms follow standard semiconductor industry conventions. Q: Do I need to install anything? A: No. SemiFab AI runs entirely in the web browser. All calculations are performed client-side with no server dependency. ## 한국어 FAQ (Korean FAQ) Q: 세미팹AI는 무엇인가요? A: 세미팹 AI(영문 SemiFab AI, semifabai)는 시뮬레이션 기반 반도체교육 플랫폼입니다. 현직 반도체 엔지니어가 설계한 Equipment-Level 시뮬레이터로, 반도체 공정을 직접 조작하며 학습할 수 있습니다. 줄여서 "세미팹AI", "세미팹"으로도 불립니다. Q: 세미팹AI에서는 어떤 반도체 공정을 시뮬레이션할 수 있나요? A: LPCVD, PECVD, 플라즈마 식각(RIE/ICP), 도펀트 확산, 이온주입, IEDF(이온 에너지 분포) 총 6가지 반도체 공정 시뮬레이터를 제공합니다. 여기에 더해, 미니팹(Mini Fab)에서는 공정 한 사이클 전체를 직접 만들고 측정·검사까지 할 수 있습니다. Q: 미니팹(Mini Fab)이 무엇인가요? A: 미니팹은 세미팹 AI의 웹 기반 가상 반도체 공정 실습실입니다. 개별 공정 하나가 아니라, 세정→산화→감광액 도포→노광→현상→식각→박리로 이어지는 공정 한 사이클을 처음부터 끝까지 직접 만들고, 단차계·SEM·4-point probe·LCR 미터·광학현미경 같은 가상 계측 장비로 결과를 측정·검사합니다. 입력 조건을 바꾸면 결과가 실제 반도체 물리(식각 깊이, 측벽 각도, 박막 저항, 산화막 간섭색, ARDE 등)대로 달라지고, 잘못된 레시피는 실제 현장처럼 실패해서 "왜 망했는지"를 배웁니다. SEM 단면 시각화로 완성 소자를 판단하고, 가이드 튜토리얼/자유 레시피 두 모드와 6가지 실습 시나리오(MOS 커패시터, 금속 배선 패터닝, 금속 리프트오프, ICP 식각/ARDE, 패턴 산화막 색 단차, 플라즈마 표면처리+증착)를 제공합니다. 클린룸·장비 비용·위험 없이 무한 반복 가능합니다. Q: 반도체교육 시뮬레이션이 왜 필요한가요? A: 실제 반도체 장비는 수억 원이 들고 교육에 사용할 수 없습니다. 책으로만 배우면 공정 감각이 잡히지 않고, 트러블슈팅은 현장에서만 배울 수 있었습니다. 세미팹AI는 장비 시뮬레이터로 파라미터를 직접 조작하며 결과를 실시간으로 확인하는 반도체 교육 시뮬레이션을 제공해, 신입 엔지니어 온보딩 기간을 단축하고 공대생의 실무 감각을 키웁니다. Q: 누가 세미팹AI를 사용하나요? A: 반도체 공정을 배우는 공대생(학부·대학원), 반도체 업계 신입/경력 엔지니어, 기업 교육 담당자, 연구자가 사용합니다. 기관·학교 라이선스도 제공합니다. Q: 세미팹AI는 무료인가요? A: 무료 체험이 가능합니다. https://semifabai.com 에서 코드 없이 1일차를 바로 체험할 수 있으며, 전체 커리큘럼은 유료 플랜으로 제공됩니다. Q: 시뮬레이션 결과는 정확한가요? A: 모든 시뮬레이터는 현직 반도체 엔지니어가 설계했으며, 실제 물리 법칙(Fick의 법칙, Arrhenius 방정식, LSS 이론 등)을 기반으로 계산합니다. Equipment-Level 반도체 교육 시뮬레이션으로 실무에 가까운 학습이 가능합니다. Q: 모바일에서도 쓸 수 있나요? A: 모던 브라우저(데스크톱/태블릿 권장)에서 동작합니다. 인터랙티브 차트와 SVG 다이어그램이 많아 가능한 한 데스크톱에서 사용하는 것을 권장합니다. Q: 영문 버전이 있나요? A: 현재는 한국어 인터페이스이며, 영문판은 추후 제공 예정입니다. ## Technical Architecture - Frontend: React 18, TypeScript, Vite - Styling: Tailwind CSS with custom navy theme - Hosting: Firebase Hosting - Calculations: Pure client-side JavaScript (deterministic, no API calls) - Charts: Real-time interactive visualization - Animations: SVG-based process diagrams ## Contact - Email: youdamcompany@gmail.com - Website: https://semifabai.com